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Phenom

Automated SEM-EDS Particle Analysis System

Automated particle analysis platform for morphology observation, elemental composition analysis, and source identification

Phenom ParticleX / Phenom SEM-EDS enables automated search, SEM morphology observation, EDS elemental analysis, particle classification, and report generation for anomalous particles. Analysis results support anomalous particle review, source identification, supplier quality verification, cleaning process optimization, and pre-failure-analysis assessment.

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7x24h Fully automated analysis
Automatic detection Particles of copper, zinc, etc.
Customized analysis Meet various requirements
Automated SEM-EDS Particle Analysis System
Product Overview Typical Applications Product Parameters Download Center Related Products

PRODUCT OVERVIEW

Product Overview

Phenom ParticleX / Phenom SEM-EDS is used for morphology observation, elemental composition analysis, and particle classification of anomalous particles. For particles already discovered and positioned by Fastmicro, it can further confirm particle morphology, elemental composition, and potential source indicators.

Product Overview

  • These platforms use SEM to acquire particle morphology information and EDS to acquire elemental composition information, enabling distinction of metals, ceramics, silicon/oxides, organics, fibers, and other unknown particles. With automated particle search, classification, and report generation capabilities, they complement Fastmicro particle inspection, defect location, and deposition monitoring.

Typical Value

  • Supports anomalous particle review
  • Provides elemental composition evidence
  • Generates particle classification results
  • Delivers morphology and elemental evidence for source investigation
  • Can be used in conjunction with Fastmicro inspection results

Key Features

  • Automated particle search
  • High-resolution SEM morphology observation
  • EDS elemental composition analysis
  • Particle classification
  • Report generation
  • Supports source investigation

Fully automatic one-touch analysis

24/7 Unattended Operation

Long-life, stable CeB6 filament

No need for frequent replacement

Hardware-software integration

Smooth operation and unified after-sales service.

Built-in shock and magnetic resistance

Suitable for workshops or laboratories.

Ensuring Report Compliance

Capable of automatically generating reports on composition, dimensions, distribution, and pass/fail status.

High-throughput processing

Combines fully automated cleanliness analysis with standard electron microscopy capabilities.

TYPICAL APPLICATION

Typical Applications

Automated contaminant particle classification

Automated contaminant particle classification

Automated contaminant particle identification

Automated contaminant particle identification

Automated high-resolution image acquisition

Automated high-resolution image acquisition

Automated EDS compositional analysis

Automated EDS compositional analysis

Filtration membrane sample holder for filter particle analysis

Filtration membrane sample holder for filter particle analysis

ParticleX particle/cleanliness analysis application interface

ParticleX particle/cleanliness analysis application interface

PRODUCT PARAMETER

Product Parameters

General Specifications
Product Full Name ParticleX Automated SEM-EDS Particle Analysis System
Optical Magnification 3-16 X
Electron Optical Magnification 200,000 X
Resolution Better than 8 nm
Electron Gun >3,000-hour CeB6 filament
Optical Navigation Camera Color
Accelerating Voltage Basic mode: 2kV, 5kV, 10kV, 15kV, 20kV
Advanced mode: 4.8 KV - 20.5 KV continuously adjustable
Vacuum Mode Low - Medium - High three modes
Detector Backscatter detector
Secondary electron detector (optional)
EDS detector
Fully Automated Function Automated SEM-EDS particle analysis

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